DEVELOPER & LIT-OFF
Lift-off is a method of patterning a target material (typical a metal) using a sacrificial layer (typically photoresist) to define the pattern. First, the sacrificial layer is applied and patterned; then the target material is deposited on top. The final step is the removal of the sacrificial material which lifts off the overlying target material.
Developer & Lift-Off Equipment
Lift Off OBDUCAT
Lift Off SUSS
Developer BREWER
OPTIWET-ST30
Lift Off OBDUCATAVAILABLE SOON
Lift Off SUSSAVAILABLE SOON
The Suss SD12 is a stand-alone solvent cleaner/developer/lift-off tool able to process 6” and 8” wafers. It is used for developing resist based on solvent developer and to make lift-off process thanks to a heated high-pressure jet of solvent (up to 150 bars). It is also possible to clean square substrates up to 9” like lithography glass mask for exemple.
BREWER CB100 DEVELOPER
The Brewer Science CEE 100CB is a combination spinner (used as a developer in the NTC) and hotplate system. The tool is used to uniformly apply and bake photoresist on substrates ranging from 200 mm diameter wafers down to small pieces. AII critical spin and bake parameters are automatically controlled by user programmable recipes.
The 4 tanks allows to develop several resists (HSQ, PMMA, UV resist SU8, AZ-XXXX, S1818,UV6)
Wafer size:
4″ 6” 8”
Development module:
Maximum speed : 6000rpm
4 pressurized tanks
Baking module:
1 hot plate (up to 300ºC}
Proximity1 vaccuum, contact
Maz temperature:
up to 300ª
LIFT-OFF PROCESS OPTIwet ST 30
The OPTlwet ST 30 Wet allows the development of cleaning, stripping, developing, lift-off,etc … with an easy handling of operation that facilitates repeatability.
Wafer size:
up to 0 12″ (0 300mm)
Substrate size:
up to 9″x 9″ (225 x 225mm)
Recipe input with touch screen
Number of recipes:
20
Number of steps per recipe:
40
Maximum step time:
999sec
Step time resolution:
0.1 sec
Free programmable outputs:
8
Spin motor
Spin speed:
1 rpm
Spin speed resolution:
up to 5,000 rpm
Rotation accuracy:
± 2 rpm
Acceleration:
up to 3,000 rpm/sec
