MICRO/NANOFABRICATION
The NTC has a 250 m2 clean room (class 10-100-1000-10000) with a complete production line for the micro/nanofabrication on silicon with CMOS compatible technology that allows the processing of both photonic and electronic integrated circuits. The clean room is operated by a team of process and equipment engineers with a strong experience in developing and optimizing the required manufacturing processes as well as running and maintaining the state-of-the-art equipment.
The available processes and capabilities are:
- Lithography (e-beam & DUV “Mask aligner”)
- ICP-RIE etching (Dielectric and Metal etch)
- PECVD layer deposition (SiO2, Doped SiO2 -BPTEOS-, SiN, a-Si)
- E-beam evaporation (metals, ITO, GST)
- Lift-off
- Conventional & Rapid thermal annealing
The following characterization tools are also available:
- SEM
- AFM
- Profilometer
- FTIR
- Spectroscopic Ellipsometer
- RAMAN
- SNOM
- Wet Benches and Dry Rinse Spinner: FSI Mercury reactor, SEMITOOOL organic solvent system
- Conventional & Rapid Thermal Annealing
- Deposition of Polysilicon and Dielectric Layers with precise refractive index control: 2 PECVD Applied Materials cluster tools (a-Si:H, Si3N4, TEOS-based B&P doped glasses)
- Resist spinner, develop track and high pressure spray lift-off system
- Lithography:
- Vistec EBPG5000 (100kV)
- Raith 150 e-Beam direct writing (30kV)
- EVG 620 DUV Mask Aligner system
- TEL Mk VZ Developer & Coater
- Dry Etching systems (RIE, ICP): STS and Corial 500 systems.
- Physical Vapor Deposition (PVD): 2 Pfeiffer E-beam evaporation and Emitech DC sputter systems
- Metrology: Hitachi SEM and optical microscopes for x-section analysis of small samples, JEOL FIB for x-section analysis of 6” wafers.
Rafael Bueno Barbeyto - Group leader
Amadeu Griol Barres - Postdoctoral researcher
José Ángel Ayúcar Ruiz - Process engineer
Juan Hurtado Montañés - Process engineer
Laurent Christophe Bellieres - Process engineer
Todora Ivanova Angelova - Process engineer
Miroslavna Kovylina Zabyako - Process engineer
David Zurita Herranz - Process engineer
Alfredo Peñarrubia Blasco - Technical staff
Luis Collado Aranda - Technical staff
Cristina Villegas Martínez - Technical staff
Jose Luis Quintanilla Ruiz - Technical staff
