DEVELOPER & LIT-OFF

Lift-off is a method of patterning a target material (typical a metal) using a sacrificial layer (typically photoresist) to define the pattern. First, the sacrificial layer is applied and patterned; then the target material is deposited on top. The final step is the removal of the sacrificial material which lifts off the overlying target material.

Developer & Lift-Off Equipment

Lift Off OBDUCAT

Lift Off SUSS

Developer BREWER

OPTIWET-ST30

Lift Off OBDUCATAVAILABLE SOON

Lift Off SUSSAVAILABLE SOON

The Suss SD12 is a stand-alone solvent cleaner/developer/lift-off tool able to process 6” and 8” wafers. It is used for developing resist based on solvent developer and to make lift-off process thanks to a heated high-pressure jet of solvent (up to 150 bars). It is also possible to clean square substrates up to 9” like lithography glass mask for exemple.

BREWER CB100 DEVELOPER

The Brewer Science CEE 100CB is a combination spinner (used as a developer in the NTC) and hotplate system. The tool is used to uniformly apply and bake photoresist on substrates ranging from 200 mm diameter wafers down to small pieces. AII critical spin and bake parameters are automatically controlled by user programmable recipes.

The 4 tanks allows to develop several resists (HSQ, PMMA, UV resist SU8, AZ-XXXX, S1818,UV6)

Wafer size:

4″ 6” 8”

Development module:

Maximum speed : 6000rpm
4 pressurized tanks

Baking module:

1 hot plate (up to 300ºC}
Proximity1 vaccuum, contact

Maz temperature:

up to 300ª

LIFT-OFF PROCESS OPTIwet ST 30

The OPTlwet ST 30 Wet allows the development of cleaning, stripping, developing, lift-off,etc … with an easy handling of operation that facilitates repeatability.

Wafer size:

up to 0 12″ (0 300mm)

Substrate size:

up to 9″x 9″ (225 x 225mm)

Recipe input with touch screen

Number of recipes:

20

Number of steps per recipe:

40

Maximum step time:

999sec

Step time resolution: 

0.1 sec

Free programmable outputs:

8

Spin motor

Spin speed:

1 rpm

Spin speed resolution:

up to 5,000 rpm

Rotation accuracy:

± 2 rpm

Acceleration:

up to 3,000 rpm/sec